Description
The National Institute of Standards and Technology (NIST), Precision Engineering Division of the Manufacturing Engineering Laboratory intends to negotiate, on a sole source basis, under authority of FAR 13.106-1(b) (1), with the Nanofab Laboratory of the University of Albany, Albany, New York 12203, for the acquisition of services to develop software to model the electron beam interaction in variable pressure mscanning electron microscopes for ultimately achieving accurate metrology with these instruments. Research and development services with respect to system design, modeling, and image analysis are required in support of this project. *****Sole source determination is based on the facts that the activity of the Scanning Electron Microscope Laboratory of the Nanoscale Metrology group has moved into new territories, including the use of variable pressure scanning electron microscope (SEM). This microscope will be used as the platform for the NIST Reference dimensional metrology SEM. In order to accurately measure and certify as standards various integrated and nano-technology structures, accurate models must be used. A suitable model that rigorously adheres to the physics of the electron beam-sample material interaction allows for much better results at the nanoscale, where the excited volume is comparable or larger than the needed measurement resolution and accuracy. NIST has excellent high-vacuum modeling capability but lacks suitable low vacuum modeling solution. Low vacuum scanning electron microscopy is a leading technology for next generation critical dimension metrology on highly insulating materials and other difficult artifacts including photolithographic masks, resist samples, and low-k dielectrics. The operating principles, signal amplification, signal detection, and image interpretation are all distinctly different from conventional high vacuum microscopy and are not fully known yet. Furthermore, the interaction of primary and emitted electrons with gaseous molecules and ions make several additional contributions to the image formation. While all of these issues have been identified, the associated mechanisms are not sufficiently understood to allow unambiguous critical dimension measurements. SUNY, Albany NY is the leader in modeling for environmental scanning electron microscopy. Dr. Bradley Thiel, associate professor and associate director of metrology at the College of Nanoscale Science and Engineering is the world-leading expert in the development of models for accurate CD metrology and elemental analysis. SUNY, Albany NY (Nanofab 300 South 255 Fuller Road Albany, NY 12203) offers the needed modeling software for environmental scanning electron microscopy and has the knowledge and software to make these and the existing NIST modeling work together. *****The North American Industry Classification System (NAICS) code for this acquisition is 541990, and the size standard is $6.5 million. ******A determination by the Government not to compete the proposed acquisition based upon responses to this notice is solely within the discretion of the Government. Information received will normally be considered solely for the purpose of determining whether to conduct a competitive procurement. *****No solicitation package will be issued. This notice of intent is not a request for competitive quotations. However, responses received by July 28, 2006 will be considered by the Government.