66--LOW PRESSURE CHEMICAL VAPOR DEPOSITION SYSTEM FOR DEPOSITION OF SILICON DIOXIDE

THIS NOTICE CONSTITUTES AMENDMENT NO. 1 TO THE COMBINED SYNOPSIS/RFQ FOR LOW PRESSURE CHEMICAL VAPOR DEPOSITION SYSTEM FOR DEPOSITION OF SILICON DIOXIDE NNC07214452Q. Companies shall acknowledge all amendment(s) in their quote. This notice serves as the official amendment to subject synopsis/RFQ and a written amendment will not be issued. The purpose of this amendment is to add the web address to additional documentation for this Combined Synopsis Solicitation. http://prod.nais.nasa.gov/cgi-bin/eps/sol.cgi?acqid=126299#Other%2001 Companies shall provide the information stated in the synopsis/RFQ posted on the NASA Acquisition Internet Service (NAIS) on August 15, 2007. Documents related to this procurement are available over the Internet. These documents reside on a World Wide Web (WWW) server which may be accessed using a WWW browser application. The Internet site, or URL, for the NASA/GRC Business Opportunities home page is http://prod.nais.nasa.gov/cgi-bin/eps/bizops.cgi?gr=D&pin=22